期刊信息

  • 刊名: 河北师范大学学报(自然科学版)Journal of Hebei Normal University (Natural Science)
  • 主办: 河北师范大学
  • ISSN: 1000-5854
  • CN: 13-1061/N
  • 中国科技核心期刊
  • 中国期刊方阵入选期刊
  • 中国高校优秀科技期刊
  • 华北优秀期刊
  • 河北省优秀科技期刊

直流辉光等离子体助进热丝CVD法沉积金刚石薄膜

  • 河北大学物理科学与技术学院, 河北保定071002
  • DOI:

Study of Diamond Films Grown on Si(100) by Glow Plasma HFCVD

摘要/Abstract

摘要:

采用直流辉光等离子体助进热丝CVD的方法,低温(550~620℃)沉积得到晶态金刚石薄膜.经X射线衍射谱、扫描电子显微镜及Raman光谱分析表明:稍高气压有利于金刚石薄膜的快速、致密生长.

Abstract:

The diamond films are deposited at low temperature (550~620℃) using glow plasma HFCVD(hot filament chemical vapor deposition). The samples morphology and structure properties have been analyzed by scanning electron microscopy (SEM) and X-ray diffraction(XRD),and it is concluded that high pressure is the optimum condition for diamond films growth.

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