期刊信息
- 刊名： 河北师范大学学报（自然科学版）Journal of Hebei Normal University (Natural Science)
- 主办： 河北师范大学
- ISSN： 1000-5854
- CN： 13-1061/N
- 中国科技核心期刊
- 中国期刊方阵入选期刊
- 中国高校优秀科技期刊
- 华北优秀期刊
- 河北省优秀科技期刊
Preparation of Atomically-flat Silicon Substrate
摘要/Abstract
摘要：
采用 RCA方法与Piranha溶液处理相结合,对单晶硅表面超声腐蚀处理,接触角、原子力显微镜(AFM)表征结果显示获得了平整高羟基密度的氧化物表面。采用水相硅烷化,将3-氨基丙基-三甲氧基硅烷(APS)组装在湿化学法处理的单晶硅表面上,AFM和X-射线光电子能谱(XPS)研究表明得到了平整均匀的氨基自组装膜。
Abstract：
With the treating method of combination of RCA and Piranha solution,anult rasmooth and homogenous surface was obtained after ultrasonic treating.Wetchemically treated silicon substrate was modified with self-assembled monolayer of 3-aminopropyl-trimethylsila ne by aqueous phase silanization,giving an ultrasmooth and homogenous surface terminated with aminogroups.
关键词
Key words：
silicon substrate
;
preparation
;
self-assembly