在线阅读 --自然科学版 2003年4期《B-et-B自组装膜对铜的缓蚀作用》
B-et-B自组装膜对铜的缓蚀作用--[在线阅读]
陈玉红1, 王庆飞1, 丁克强1,2, 崔敏1, 童汝亭1, 高政3
1. 河北师范大学化学学院, 河北石家庄 050016;
2. 中国科学院山西煤炭化学研究所, 山西太原 030001;
3. 衡水师范专科学校化学系, 河北衡水 053000
起止页码: 377--379页
DOI:
摘要
首次合成了BetB,用交流阻抗的方法探索了成膜条件对铜缓蚀效率的影响.实验发现HNO3法处理铜电极能够提高膜的质量;随着成膜时间的增长、成膜液浓度的增大,缓蚀效率增大.

Corrosion Protection of Copper by a Self-assembled Monolayer of B-et-B Schiff Base
CHEN Yu-hong1, WANG Qing-fei1, DING Ke-qiang1,2, CUI Min1, TONG Ru-ting1, GAO Zheng3
1. College of Chemistry, Hebei Normal University, Hebei Shijiazhuang 050016, China;
2. Institute of Coal Chemistry, Chinese Academy of Science, Shanxi Taiyuan 030001, China;
3. Department of Chemistry, Hengshui Normal University, Hebei Hengshui 053000, China
Abstract:
The influencing factor of Schiff base corrosion protection were discussed using electrochemical impedance spectroscopy (EIS). The results demonstrated that the monolayer quality will be increased by the treatment of copper electrode in nitric acid. The abilities of corrosion protection will be improved with the longer time of self-assembled monolayer and the increasing concentration.The mechanism of corrosion was also discussed primarily.

收稿日期: 2002-10-14
基金项目: 国家自然科学基金资助项目(29973026)

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